Facilities

CHARM Laboratory : Complex Heterostructures & Advanced Researches on Multiferroics

Facilities
  • Excimer Laser #1, #2
  •    Company
          COHERENT Co., Ltd.

       Model
          #1 : COMPex-Pro
          #2 : COMPex 205 F

       Specification
          248 nm wavelength (excited by KrF gas)
          Pulse energy : up to 750 mJ
          Maximum repetition rate : 50 Hz
          Average power : 33 W

       Contact
          Jaehyun Lee (이재현) lee.jaehyun@kaist.ac.kr
  • Pulsed Laser Deposition Chamber #A, #Y, #L, #K, #S
  •    Total 5 vacuum chambers

       Company
          Collaborated with DADA KOREA Co., Ltd.

       Specification
          Base pressure : 5.0 × 10-6 Torr
          Substrate temperature up to 800 °C (#A, #Y, #K, #S), 900 °C (#L)
          Multiple target holder (4 channel)
          Automatic laser ablation & target manipulation system (#Y, #K)
          High pressure RHEED system up to 100 mTorr (#Y, #L, #K)
          Background gas : O2, Ar (#L)
          Annealing gas : H2 (#L), N2 , O2, Ar (#L)

       Contact
          Minho Kang (강민호) 101hnmo@kaist.ac.kr
  • High Resolution Thin-film X-Ray Diffractometer
  •    Company
          PANalytical Co., Ltd.

       Model
          X’Pert-PRO MRD

       Specification
          High tension generator : Max. power : 3 kW or more
          X-ray tube with a target of Cu
          Specimen holder : 4 inch& 6 inch wafer holder
          High resolution/precision goniometer : reproducibility 0.0001° or better
          Incident beam optics for high resolution :
                   2 bounce Hybrid monochromator (Multi-layer mirror + channel cut monochrometer : Ge(022))
                   4 bounce Crystal Ge(220) / Parabolic multi layer mirror
          Diffracted beam attachment for high resolution :
                   Triple axis (analyzing crystal) attachment with channel cut crystal of Ge(220) 3 bounce
          Detector : Proportional detector (Xe) / PIXCEL-3D
          Sample Stage for High Temperature : Operating temp. range : room to 1100 ℃ or wider

       Contact
          Minho Kang (강민호) 101hnmo@kaist.ac.kr
          KARA (link)
  • Atomic Force Microscopy #1
  •    Company
          Bruker

       Specification
          TBA

       Contact
           Yong-Jun Kwon (권용준) kwonyj57@kaist.ac.kr
  • Atomic Force Microscopy #2
  •    Company
          Asylum Research

       Specification
          X & Y range : 120 μm × 120 μm
          X & Y sensors < 130 pm noise
          Z range > 15 μm ( > 40 μm option)
          Z sensor < 35 pm noise
          Light source : low-coherence infrared superluminescent diode
          DC detector noise < 10 pm
          Detector bandwidth : 7 MHz
          DC height noise < 20 pm
          AC height noise < 20 pm
          Sample size ≤ 80 mm diameter
          Sample thickness ≤ 10 mm ( ≤ 27 mm option)

       Contact
          Yong-Jun Kwon (권용준) kwonyj57@kaist.ac.kr
  • Physical Properties Measurement System (PPMS)
  •    Company
          Quantum Design

       Model
          PPMS Model 6000

       Specification
          Temperature range : 1.9 to 400 K (6 K/min. cooling, 10 K/min. warming)
          Magnetic field range : ± 9 T, max 190 Oe/s (> 1 T/min)
          Sample chamber : 2.6 cm diameter to accommodate custom probes
          Electrical transport :
                   AC Resistance : 10 μΩ - 10 MΩ in a 4-probe configuration/2 MΩ - 5 GΩ in a 2-probe configuration
                   DC Resistance : 10 μΩ - 5 MΩ in a 4-probe configuration with source currents between 2 nA – 8 mA
          Horizontal Rotator : sample rotation range of - 10˚ ~ 370˚
          Magnetometry :
                   Vibrating Sample Magnetometer (VSM); noise levels of less than 6 x 10-7 emu at 300 K

       Wide Range Resistance Measurement set
          Ke6221 : current source 1 ea.
          Ke2182a : nano voltameter 1 ea.
          Ke6517a : electrometer / high resistance meter 1 ea.
          Agilent 33210a : function generator 1 ea.
          SR830 : lock-in amplifier 1 ea.
          UHF LI 600 MHz : high frequency lock-in amplifier 1 ea.

       Contact
          Jaehyun Lee (이재현) lee.jaehyun@kaist.ac.kr
  • Low Temperature Probe System
  •    Company
          Lake Shore Cryotronics

       Model
          CPX-HF

       Specification
          Temperature range : 4.4 ~ 400 K
          Vacuum : Optional high vacuum < 5 x 10-7 Torr
          Microwave probes : Frequency range DC up to 67 GHz for RF measurements
          Probe arms with 3-axis adjustments and ± 5 theta planarization
          Sample rotation : ± 5˚ in-plane rotation
          Radiation shielding : viewport surrounds sample; outer second (partial) radiation shield
          Cooling source : Liquid helium (LHe)

       Contact
          Jaehyun Lee (이재현) lee.jaehyun@kaist.ac.kr
  • Probe station & Optical microscopy & Precision LC (Ferroelectric tester)
  •    Company
          MSTECH (Probe station)
          RADIANT TECHNOLOGIES, INC. (Precision LC)

       Specification
          Voltage Range : ±100 V
          Max. Hysteresis Frequency : 1 kHz
          Min. Pulse Width : 50 μs
          Min Rise Time : 40 μs (@ 5 V)
          Min. Resolution Electrometer : 305 μV

       Contact
          Yong-Jun Kwon (권용준) kwonyj57@kaist.ac.kr
  • Semiconductor Analyzer
  •    Company
          Tektronix

       Specifiaction
          Temperature
                   Precision: ± 3 °C
                   Operations: 10 ~ 40 °C
                   Storage: -15 ~ 60 °C
          Humidity
                   For precision: 5 ~ 60 % (non-condensing)
                   Operations: 5 ~ 80 % (non-condensing)
                   Storage: 5 ~ 90 % (non-condensing)
          Altitude
                   Operations: 0 ~ 2000 m (non-condensing)
                   Storage: 0 ~ 4600 m (non-condensing)
          Voltage & Current range
                   High voltage: -200 ~ 200 V, -10 ~ 10 mA
                   High current: -20 ~ 20 V, -100 ~ 100 mA
       Contact
          Juhyun Lee (이주현) solar314@kaist.ac.kr
  • Solartron Impedance Analyzer
  •    Company
          AMETEK Science Instruments, Solartron Analytical

       Model
          Solartron 1260 Impedance Analyzer
          Solartron 1296 Dielectric interface

       Specification
          Solartron 1260:
                   Frequency range : 10 μHz to 32 MHz
                   Signal amplitudes: up to 3 V rms
                   DC bias : up to 40.95 V
                   Current mearuement: 6 μA to 60 mA
                   Impedance ranges: 1 pF to 10 mF,    10 mΩ to 100 MΩ,    100 nH to 1000 H

          Solartron 1260 + 1296:
                   Frequency range: 10 μHz to 10 MHz
                   Signal amplitudes: up to 7 V rms
                   DC bias: up to 40 V
                   Current measurement: 1 fA to 100 mA
                   Impedance ranges: 1 pF to > 0.1F,   100 Ω to > 100 TΩ


       Contact
          Jeonghoon Suh(서정훈) chemist1104@kaist.ac.kr
  • Clean Room
  • Etching & Sputter (Ti & Pt) chamber
    Spin coater 1200D (MIDAS system)
    Hot plate PC-400D (Corning)
    UV mask aligner MDA-400s (MIDAS system)
    Quartz tube furnace


       Specification
          Base pressure: 8 × 10-5 Torr (Etching & Sputter chamber), 10 mTorr (Tube furnace)
          Background gas: N2, Ar
          1 ~ 5 nm/min etching by Ar ion. (Etching)
          Ti/Pt deposition rate up to 10 nm/min (Sputter)
          300 ~ 7000 rpm with error ± 3 % (Spin coater)
          Thickness 1 μm (Spin coater)
          Temperature up to 550 °C (Hot plate)
          Pattern precision ± 1 μm (Mask aligner)
          Up to 1050 °C (Tube furnace)

       Contact
          Jihun Kim (김지훈) jihun112@kaist.ac.kr
  • Confocal Raman Spectroscopy
  •    Company
          WITec

       Model
          WITec alpha300R

       Specification
          532 nm laser (maximum 75 mW at laser output)
          633 nm laser (maximum 35 mW at laser output)
          Ultra-High-Throughput-Spectrometer (UHTS600)
          Low Frequency Raman Filter allowing stokes- and anti-stokes Raman measurements starting at ± 10 cm-1
          Motorized z-stage (single step 10 nm resolution)
          Motorized x-y sample scanning stage (step 100 nm)
          Objective lens :
                   10x(N.A. 0.25/WD 11mm), 50x(N.A. 0.35/WD 18mm), 100x(N.A. 0.9/WD 0.31mm), 100x(N.A. 0.8/WD 3.4mm)
          Polarization option
          Fast photocurrent measurement kit
          LN2 portable cryostat (> 90 K)

       Contact
          Minho Kang (강민호) 101hnmo@kaist.ac.kr
  • Fume Hood
  •    Sonicator

       Contact
          Yong-Jun Kwon (권용준) kwonyj57@kaist.ac.kr
  • Box Furnace
  •    Specification
          Max Temperature : 1500 ℃

       Contact
          Yong-Jun Kwon (권용준) kwonyj57@kaist.ac.kr